Toppan Photomask, 400 Texas Ave, Round Rock, TX 78664, US

HistoryMolecular Imprints (MII) was founded in 2001 as a result of chemistry and mechanical engineering research done at the University of Texas, Austin. Dr. Grant Willson (Professor of Chemistry) and Dr. S.V. Sreenivasan (Professor of Mechanical Engineering) teamed up to perfect the use of nanoimprint lithography in forming the nano-scale features found in today's complex chip circuitry and high capacity hard disk drives. Today, MII is the world's market and technology leader for nanoimprint lithography and continues to expand the application of it's technology to exciting emerging fields of high-brightness LED lighting, solar energy, battery and biomedical research.SpecialtiesMolecular Imprints, Inc. (MII) is the technology leader for high-resolution, low cost-of-ownership nanoimprint lithography systems and solutions in the hard disk drive (HDD) and semiconductor industries. MII technology is based on research done at the University of Texas, Austin, and we remain an Austin-based technology company. MII is leveraging its innovative Jet and Flash Imprint Lithography (J-FIL) with IntelliJet material application technology to become the worldwide market and technology leader in high-volume patterning solutions for storage and memory devices, while enabling emerging markets in optics, biotechnology, and other industries. MII enables nanoscale patterning by delivering a comprehensive nanopatterning solution that is affordable, compatible and extendible to sub-10-nanometer resolution levels. For more information, visit www.molecularimprints.com.