General Plasma is a leading provider of innovative technologies in Menlo Park, CA, specializing in the development and sale of cutting-edge plasma sources and vacuum systems. With a focus on high deposition rates, exceptional uniformity, and long-term process stability, their world-class PECVD technology sets new standards in the industry.
Recognized as pioneers in linear ion source technology, General Plasma offers a range of solutions for pre-treatment, metal etching, and various other applications. Their patented and patent-pending innovations, including rotary magnetron magnet bars and end blocks, address real process and production challenges, making them a trusted choice for advanced vacuum thin film coating solutions.
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